Semiconductor cleanroom.
The electronics and semiconductor industry imposes the most extreme purity requirements on the market. Wafer handling, anti-static blowing, inert chambers for etching or packaging require air and nitrogen completely free of particles (ISO 14644 class 5 to 7) with extremely low dew point.
What needs to be solved.
- 01Achieve particle purity below 0.01 µm on compressed air and technical nitrogen, in compliance with SEMI F and ISO 8573-1 class 0.
- 02Guarantee total system availability — an unplanned shutdown on an etching line can cost several hundred thousand euros per hour.
- 03Generate on-site nitrogen at 99.999 % purity with a total cost of ownership lower than bottle or bulk delivery.
A concrete example.
A class ISO 6 semiconductor foundry installs a CZ-N2-PSA-100 nitrogen generator producing 100 Nm³/h at 99.999 % purity, coupled with a CZ-SLT-75V oil-free screw compressor as the purge air source. Payback versus bottled nitrogen delivery is achieved in 16 months. Three stages of ISO 8573-1 class 0 filtration and a −70 °C adsorption dryer guarantee wafer specifications.
Our technical answer.
Combination of CEZIUM machines sized for this process. Technical details in the distributor pack.
Compliances attested.
Compliances are verified case by case according to the selected model and audit scope. Complete documentation provided with each machine.
Describe your process. We'll propose the right machine combination.
Reply from our technical team within 24 working hours. Free pre-study including sizing and budget estimate.